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The DL-1000 from Nano Systems Solutions utilizes a telecentric optics illumination system and a digital micromirror device (DMD) to perform immediate exposure onto photo resist of pattern data as desired, which is designed on a PC screen, without using Photomask. This allows easy and accurate overlay alignment compare to separate optic path observation system.
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Detailed Specs
DMD as high resolution pattern generator with ultra-fast mirror switching speed, DL-1000 is able to pattern your microstructures easily and fast.
Features
– 1um resolution(0.5um or 2um resolution are the option)
– Both Scanning and Step & Repeat mode are available
– Maintenance Free System by the use of Long Life Light Source (LED or semiconductor Laser)
– High Speed patterning speed > 1000mm 2/min (Laser Light Source)
– Our smart real-time Auto Focus able to pattern even on the thin-transparent substrate, patterned substrate, and warped substrate
– Simultaneous observation of surface pattern and exposure pattern by coaxial observation system, TTL(Through The Lens) and it allows high accuracy overlay with our own image processing technology.
– Data convertor for DXF and GDSII is available.
– Gray Scale Image can be exposed for 3D structuring
– Down to 12.5nm address grid unit
– Wide range of substrate Size: few mm up to metric size
Applications
– Photo semiconductor device development
– Development of communications devices
– Development of light-curing materials
– Micro ID numbering
– MEMS
– Bio, Life science, complex chemistry (Micro TAS, Microfluidics)
– Localized exposure and selective exposure applications, etc.
– Mix & Match with Ebeam Lithography
– Industrial field (reticle and photomask production, micro mold, compound semiconductor fabrication, etc.)