Semiconductor >> Vinci Technologies, France

Molecular Beam Epitaxial System (MBE)

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Detailed Specs

Vinci Technologies offer e range of possibility that allows customers to own a Molecular Beam Epitaxial System (MBE) system as flexible as their specifications need. The main system features are;

– 10-10 mbar chamber including cryopanel
– 5 axis substrate manipulator (-120°C to +1500°C)
– 1 or 2 UHV e-beam sources / Up to 4 MBE sources
– 18 material sources
– 3 sensors for thickness measurement
– Turbomolecular and ion pumps
– RHEED, LEED analysis
– Load lock with samples storage
– Compatible with sample transfer tunnel and glove box
– Scalable system