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Nano Imprint lithography (NIL) has evolved from a niche technology to a powerful high-volume manufacturing method that is able to serve today’s needs and overcome the challenges of increasing complexity of biotechnology devices. In addition to structuring technologies, sealing is a central process. Thus, bonding of different device layers, capping layers and interconnection layers is a key process that can be implemented together with NIL in an efficient large-area batch process.
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Detailed Specs
Thermal NIL / Hot embossing:
Application: Replication of microfluidic patterns into polymer materials and glass
Features:
1. Simultaneous replication of micro- and nanostructures
2. Imprinting into bulk polymer materials or glass
3. Suitable for spin-on thermoplastics
4. Low residual stress
5. High replication accuracy down to 50 nm
6. High aspect ratio features
UV Nano Imprint Lithography:
Application: Nanostructured surfaces with the highest resolution
Features:
1. Robust and field-proven proprietary SmartNIL ® technology
2. Volume-proven imprinting technology with superior replication fidelity and resolution down to 20 nm
3. Room-temperature process based on UV-curable resist
4. Imprinted UV-NIL resist directly suitable as functional layer
5. High-uniform residual layers for optimum pattern transfer by etching
µ-CONTACT PRINTING (µ-CP):
Application: Transfer of biomolecules onto substrates in a distinct pattern through
Features:
1. Local modification of surface chemistry
2. Precise placement of capture molecules for bio-sensing applications
3. Applicable on all common surfaces
4. Micrometer and nanometer resolution