Bio Engineering >> EV Group, Austria

Nano Imprint Lithography

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      Detailed Specs

      Thermal NIL / Hot embossing:

      Application: Replication of microfluidic patterns into polymer materials and glass
      Features:
      1. Simultaneous replication of micro- and nanostructures
      2. Imprinting into bulk polymer materials or glass
      3. Suitable for spin-on thermoplastics
      4. Low residual stress
      5. High replication accuracy down to 50 nm
      6. High aspect ratio features

      UV Nano Imprint Lithography:

      Application: Nanostructured surfaces with the highest resolution

      Features:
      1. Robust and field-proven proprietary SmartNIL ® technology
      2. Volume-proven imprinting technology with superior replication fidelity and resolution down to 20 nm
      3. Room-temperature process based on UV-curable resist
      4. Imprinted UV-NIL resist directly suitable as functional layer
      5. High-uniform residual layers for optimum pattern transfer by etching

      µ-CONTACT PRINTING (µ-CP):

      Application: Transfer of biomolecules onto substrates in a distinct pattern through
      Features:
      1. Local modification of surface chemistry
      2. Precise placement of capture molecules for bio-sensing applications
      3. Applicable on all common surfaces
      4. Micrometer and nanometer resolution