Bio Engineering >> EV Group, Austria

Nano Imprint Lithography

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Detailed Specs

Thermal NIL / Hot embossing:

Application: Replication of microfluidic patterns into polymer materials and glass
Features:
1. Simultaneous replication of micro- and nanostructures
2. Imprinting into bulk polymer materials or glass
3. Suitable for spin-on thermoplastics
4. Low residual stress
5. High replication accuracy down to 50 nm
6. High aspect ratio features

UV Nano Imprint Lithography:

Application: Nanostructured surfaces with the highest resolution

Features:
1. Robust and field-proven proprietary SmartNIL ® technology
2. Volume-proven imprinting technology with superior replication fidelity and resolution down to 20 nm
3. Room-temperature process based on UV-curable resist
4. Imprinted UV-NIL resist directly suitable as functional layer
5. High-uniform residual layers for optimum pattern transfer by etching

µ-CONTACT PRINTING (µ-CP):

Application: Transfer of biomolecules onto substrates in a distinct pattern through
Features:
1. Local modification of surface chemistry
2. Precise placement of capture molecules for bio-sensing applications
3. Applicable on all common surfaces
4. Micrometer and nanometer resolution