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SVT Associates’ NorthStar™ Atomic Layer Deposition (ALD) system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8 precursor lines and a hot wall — cross flow deposition chamber, a wide range of applications may be performed from a single system. Sample introduction is rapid and convenient with a quick hatch or the optional load lock. The NorthStar ALD system can be interfaced with other deposition and metrology tools.
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Detailed Specs
SVT Associates’ Atomic Layer Deposition (ALD) system is a versatile research deposition tool for thermal or energy enhanced ALD.
• With up to 8 precursor lines and a hot wall deposition chamber, a wide range of applications may be performed by a single system.
• Sample introduction is rapid and convenient with a quick hatch or the optional load lock.
• SVT Associates’ ALD system can be interfaced with other deposition and metrology tools.
• Integration of in-situ metrology tools and the RoboALD™ software/system automation increases process reproducibility.
• Fully UHV Upgradeable.
• Demo and deposition services available.
Atomic Layer Deposition System Applications:
1. High-k Dielectrics
2. Nanocoatings
3. Surface Modification Layers
4. Corrosion protection layers
5. Moisture barrier layers
6. Device Encapsulations
7. MEMS
8. Photonic Crystals
Atomic Layer Deposition Equipment Options:
1. Load Lock for rapid sample exchange
2. Plasma Component
3. Ozone Delivery System
4. Residual Gas Analysis — QMS
5. Quartz Crystal Deposition Monitor
6. In-Situ Ellipsometry
7. Transfer to UHV deposition systems