Semiconductor >> ULTECH Co. Ltd, South Korea

Furnaces

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Detailed Specs

Ultech Furnace Systems are designed for diffusion, oxidation and Low Pressure Chemical Vapor Deposition (LPCVD) applications. The systems require considerably less floor space and electrical power than conventional furnaces of equal capacity. The Low Pressure Chemical Vapor Deposition (LPCVD) Furnace have been well accepted as dependable process tools both in the semiconductor industry and in the R&D community. They offer superior performance and process uniformities. The design incorporates several of the most advanced concepts required for high performance wafer processing tools.