Semiconductor >> SURFACE & SURFACE systems+technology GmbH & Co. KG

Pulsed Layer Deposition(PLD)

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Detailed Specs

Surfacetec’s Pulsed laser deposition (PLD) is a versatile process for thin film deposition with the major advantage of stoichiometric material transfer from a target to the substrate. The SURFACE Pulsed Laser Deposition (PLD)-Workstation is the excellent prototyping and research system for thin films, providing easy access to new materials and especially to advanced oxide layers. The typical features are:

– All-in-one-frame solution for fast, “plug’n’play” installation
– Advanced process automation, perfect also for supperlattice deposition
– Oxygen resistant substrate heater with advanced temperature measurement, 1000°C
– Laser heating of substrate optionally available
– Flexible advanced target manipulator with cross-contamination shielding
– Vacuum chamber prepared for system upgrades (RHEED, plasma sources, OES/FTIR,…)
– SURFACE Fluence Control option, for 100% reproducible results
– Fully enclosed beam line for hassle-free, safe operation
– Turn-key delivery
– Advanced online support via internet