Semiconductor >> ULTECH Co. Ltd, South Korea

Rapid Thermal Annealing System (RTA/RTP)

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Detailed Specs

ULTECH’s Rapid Thermal Annealing (RTA) system features include;

– Substrate size & load capacity : 4inch wafer – 1 wafer/batch

– Temperature range : RT~1,000 ℃

– Substrate holder : Quartz (pin)

– Rotary pump

– Manual angle valve

– MFC: O2(1slm), N2(1slm)

– Manual control (switch panel)

RTA offered by ULTECH includes: Single Side heating and Double side heating