Semiconductor & Solar >> ULTECH Co. Ltd, South Korea

Wet Bench

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Detailed Specs

ULTECH’s Wet Bench Tool offers:

Р Minimizing foot print from optimizing design in fluid tank
– Smaller usage of chemicals and pure water because of excellent design in
piping
–¬†Easy control of temperature, flux, and mixing rate of the fluid
-Easy control and maintenance
– Available mixing of Cleaning / Chemical etching / Solvent / Developer bench

Specifications:

– Sample size & throughput : Up to 8inch, 1 cassete (25 wafers)
– Cleaning wet bench : SC-1/2, DHF, QDR, KOH, H3PO4
– Etching wet bench : DHF, Metal Etch, QDR
– Solvent wet bench : Solvent, QDR
– Developer wet bench : Developer, QDR
– Spin dry bench (option)
– Process control : Manual process control (option – PLC)