Semiconductor & Solar >> ULTECH Co. Ltd, South Korea

Wet Bench

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      Detailed Specs

      ULTECH’s Wet Bench Tool offers:

      Р Minimizing foot print from optimizing design in fluid tank
      – Smaller usage of chemicals and pure water because of excellent design in
      piping
      –¬†Easy control of temperature, flux, and mixing rate of the fluid
      -Easy control and maintenance
      – Available mixing of Cleaning / Chemical etching / Solvent / Developer bench

      Specifications:

      – Sample size & throughput : Up to 8inch, 1 cassete (25 wafers)
      – Cleaning wet bench : SC-1/2, DHF, QDR, KOH, H3PO4
      – Etching wet bench : DHF, Metal Etch, QDR
      – Solvent wet bench : Solvent, QDR
      – Developer wet bench : Developer, QDR
      – Spin dry bench (option)
      – Process control : Manual process control (option – PLC)